產(chǎn)品[
感應加熱式高速升降溫爐
]資料
如果您對該產(chǎn)品感興趣的話,可以
產(chǎn)品名稱:
感應加熱式高速升降溫爐
產(chǎn)品型號:
RLA-3100
產(chǎn)品展商:
其它品牌
產(chǎn)品文檔:
無相關文檔
簡單介紹
感應加熱式高速升降溫爐4 to 8 inch wafer size is available
Multi axis clean robot enables high speed and accurate wafer transfer
Max 50 wafers continuous processing is available
感應加熱式高速升降溫爐的詳細介紹
感應加熱式高速升降溫爐:

4 to 8 inch wafer size is available
Multi axis clean robot enables high speed and accurate wafer transfer
Max 50 wafers continuous processing is available
Equipped with operator friendly high performance control system
Vacuum designed quartz tube enables accurate gas substitution and process at vacuum pressure
Outer dimension | | W900×D1850×H2500mm |
---|
Operation temperature | 400 to 1200℃ |
---|
Heat up rate | Max.200℃/sec |
---|
Lamp layout | Upper & lower cross lamp arrays |
---|
Number of control zone | 6 |
---|
Wafer size | 4 to 8 inch |
---|
I/O port | 2 |
---|
Wafer transfer | single wafer / multi-axis clean robot |
---|
Controller | Model RSC1000 |
---|
Option | Vacuum system, HOST communication(HSMS/GEM) |
---|